Ebook Free EUV Lithography (SPIE Press Monograph Vol. PM178SC)
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EUV Lithography (SPIE Press Monograph Vol. PM178SC)
Ebook Free EUV Lithography (SPIE Press Monograph Vol. PM178SC)
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Review
Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc.
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About the Author
Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
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Product details
Paperback: 702 pages
Publisher: SPIE--The International Society for Optical Engineering (December 11, 2008)
Language: English
ISBN-10: 0819496405
ISBN-13: 978-0819496409
Package Dimensions:
9.9 x 7 x 1.5 inches
Shipping Weight: 2.4 pounds
Average Customer Review:
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Amazon Best Sellers Rank:
#5,565,649 in Books (See Top 100 in Books)
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